A scheme of the technological process of developing multilayer gas fields is proposed. The scheme is intended for optimal control of the development based on the injection feature of jet devices. The control is shown to be advantageously performed on the basis of the especially developed basic chemes to optimize technological modes of the jet devices. An analysis of the basic optimization schemes is carried out. As a result of the analysis, it is identified that one of the main advantages of the proposed schemes is a possibility of optimally controlling both the debit and the recovery ratio of multilayer gas fields with bad technological characteristics.